 | Title: | Advances in Resist Materials and Processing Technology XXIV | | Desc: | Proceedings of a meeting held 25 February - 2 March 2007, San Jose, California, USA.
At SPIE Advanced Lithography | | Series: | Proceedings of SPIE Volume 6519 | | Editor: | Lin, Qinghuang | | ISBN: | 9780819466389 | | Pages: | 1,348 (2 Vols) (approx) | | Format: | Softcover | | Publ: | SPIE - International Society For Optics and Photonics | | POD Publ: | Curran Associates, Inc. ( Mar 2007 ) |
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