 Title: | Advances in Resist Materials and Processing Technology XXIV | Desc: | Proceedings of a meeting held 26-28 February 2007, San Jose, California, USA.
At SPIE Advanced Lithography | Series: | Proceedings of SPIE Volume 6519 | Editor: | Lin, Qinghuang | ISBN: | 9780819466389 | Pages: | 1,348 (2 Vols) (approx) | Format: | Softcover | Publ: | SPIE - International Society for Optics and Photonics | POD Publ: | Curran Associates, Inc. ( Mar 2007 ) |
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