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PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XIV

PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XIV

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PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XIV
Item #: 42879
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Product Description
Title:Photomask and Next-Generation Lithography Mask Technology XIV
Desc:Proceedings of a meeting held 17-19 April 2007, Yokohama, Japan.
Series:Proceedings of SPIE Volume 6607
Editor:Watanabe, Hidehiro
ISBN:9780819467454
Pages:1,028 (2 Vols) (approx)
Format:Softcover
Publ:SPIE - International Society For Optics and Photonics
POD Publ:Curran Associates, Inc. ( May 2007 )
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