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PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XVI

PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XVI

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PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XVI
Item #: 43635
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Product Description
Title:Photomask and Next-Generation Lithography Mask Technology XVI
Desc:Proceedings of a meeting held 8-10 April 2009, Yokohama, Japan.
Series:Proceedings of SPIE Volume 7379
Editor:Hosono, Kunihiro
ISBN:9780819476562
Pages:858 (1 Vol) (approx)
Format:Softcover
Publ:SPIE - International Society For Optics and Photonics
POD Publ:Curran Associates, Inc. ( May 2009 )
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