PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XVI

Item #: 43635

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$170.00

Title:	Photomask and Next-Generation Lithography Mask Technology XVI
Desc:	Proceedings of a meeting held 8-10 April 2009, Yokohama, Japan.
Series:	Proceedings of SPIE Volume 7379
Editor:	Hosono, Kunihiro
ISBN:	9780819476562
Pages:	858 (1 Vol) (approx)
Format:	Softcover
Publ:	SPIE - International Society for Optics and Photonics
POD Publ:	Curran Associates, Inc. ( May 2009 )