 Title: | Photomask and Next-Generation Lithography Mask Technology XVI | Desc: | Proceedings of a meeting held 8-10 April 2009, Yokohama, Japan.
| Series: | Proceedings of SPIE Volume 7379 | Editor: | Hosono, Kunihiro | ISBN: | 9780819476562 | Pages: | 858 (1 Vol) (approx) | Format: | Softcover | Publ: | SPIE - International Society for Optics and Photonics | POD Publ: | Curran Associates, Inc. ( May 2009 ) |
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