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PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XVII

PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XVII

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PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XVII
Item #: 44004
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Product Description
Title:Photomask and Next-Generation Lithography Mask Technology XVII
Desc:Proceedings of a meeting held 13-15 April 2010, Yokohama, Japan.
Series:Proceedings of SPIE Volume 7748
Editor:Hosono, Kunihiro
ISBN:9780819482389
Pages:696 (1 Vol) (approx)
Format:Softcover
Publ:SPIE - International Society For Optics and Photonics
POD Publ:Curran Associates, Inc. ( May 2010 )
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