 | Title: | Advances in Resist Materials and Processing Technology XXIX | | Desc: | Proceedings of a meeting held 13-15 February 2012, San Jose, California, USA.
At SPIE Advanced Lithography | | Series: | Proceedings of SPIE Volume 8325 | | Editor: | Somervell, Mark H. | | ISBN: | 9780819489814 | | Pages: | 686 (1 Vol) (approx) | | Format: | Softcover | | Publ: | SPIE - International Society For Optics and Photonics | | POD Publ: | Curran Associates, Inc. ( Apr 2012 ) |
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