 Title: | Advanced Etch Technology for Nanopatterning | Desc: | Proceedings of a meeting held 13-14 February 2012, San Jose, California, USA.
At SPIE Advanced Lithography | Series: | Proceedings of SPIE Volume 8328 | Editor: | Zhang, Ying | ISBN: | 9780819489845 | Pages: | 224 (1 Vol) (approx) | Format: | Softcover | Publ: | SPIE - International Society for Optics and Photonics | POD Publ: | Curran Associates, Inc. ( Apr 2012 ) |
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