 Title: | Advances in Resist Materials and Processing Technology XXX | Desc: | Proceedings of a meeting held 25-27 February 2013, San Jose, California, USA.
At SPIE Advanced Lithography | Series: | Proceedings of SPIE Volume 8682 | Editor: | Somervell, Mark H. | ISBN: | 9780819494641 | Pages: | 610 (1 Vol) (approx) | Format: | Softcover | Publ: | SPIE - International Society for Optics and Photonics | POD Publ: | Curran Associates, Inc. ( Apr 2013 ) |
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