 | Title: | Advanced Etch Technology for Nanopatterning III | | Desc: | Proceedings of a meeting held 23-27 February 2014, San Jose, California, USA.
At SPIE Advanced Lithography | | Series: | Proceedings of SPIE Volume 9054 | | Editor: | Oehrlein, Gottlieb S. | | ISBN: | 9780819499776 | | Pages: | 188 (1 Vol) (approx) | | Format: | Softcover | | Publ: | SPIE - International Society For Optics and Photonics | | POD Publ: | Curran Associates, Inc. ( Apr 2014 ) |
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