 | Title: | Advanced Etch Technology for Nanopatterning IV | | Desc: | Proceedings of a meeting held 22-26 February 2015, San Jose, California, USA.
At SPIE Advanced Lithography | | Series: | Proceedings of SPIE Volume 9428 | | Editor: | Lin, Qinghuang | | ISBN: | 9781628415308 | | Pages: | 182 (1 Vol) (approx) | | Format: | Softcover | | Publ: | SPIE - International Society For Optics and Photonics | | POD Publ: | Curran Associates, Inc. ( Apr 2015 ) |
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