 Title: | Advanced Etch Technology for Nanopatterning IV | Desc: | Proceedings of a meeting held 23-25 February 2015, San Jose, California, USA.
At SPIE Advanced Lithography | Series: | Proceedings of SPIE Volume 9428 | Editor: | Lin, Qinghuang | ISBN: | 9781628415308 | Pages: | 182 (1 Vol) (approx) | Format: | Softcover | Publ: | SPIE - International Society for Optics and Photonics | POD Publ: | Curran Associates, Inc. ( Apr 2015 ) |
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