 Title: | Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS 2: New Materials, Processes, and Equipment | Desc: | Proceedings of a meeting held 30 October - 2 November 2006, Cancun, Mexico.
210th ECS Meeting | Series: | ECS Transactions Volume 3 No.02 | Editor: | Roozeboom, F. et al. | ISBN: | 9781510866508 | Pages: | 460 (1 Vol) | Format: | Softcover | TOC: | View Table of Contents | Publ: | Electrochemical Society ( ECS ) | POD Publ: | Curran Associates, Inc. ( Aug 2018 ) |
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