ADVANCED GATE STACK, SOURCE/DRAIN, AND CHANNEL ENGINEERING FOR SI-BASED CMOS 6: NEW MATERIALS, PROCESSES, AND EQUIPMENT (217TH ECS MEETING)

Item #: 40299

Our Price:

$143.00

Pricing: ECS Member # :

Title:	Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS 6: New Materials, Processes, and Equipment
Desc:	Proceedings of a meeting held 25-30 April 2010, Vancouver, Canada. 217th ECS Meeting
Series:	ECS Transactions Volume 28 No.01
Editor:	Gusev, E. P. et al.
ISBN:	9781510866713
Pages:	412 (1 Vol)
Format:	Softcover
TOC:	View Table of Contents
Publ:	Electrochemical Society ( ECS )
POD Publ:	Curran Associates, Inc. ( Aug 2018 )