 Title: | Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS 6: New Materials, Processes, and Equipment | Desc: | Proceedings of a meeting held 25-30 April 2010, Vancouver, Canada.
217th ECS Meeting | Series: | ECS Transactions Volume 28 No.01 | Editor: | Gusev, E. P. et al. | ISBN: | 9781510866713 | Pages: | 412 (1 Vol) | Format: | Softcover | TOC: | View Table of Contents | Publ: | Electrochemical Society ( ECS ) | POD Publ: | Curran Associates, Inc. ( Aug 2018 ) |
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