 Title: | Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS 4: New Materials, Processes, and Equipment | Desc: | Proceedings of a meeting held 18-22 May 2008, Phoenix, Arizona, USA.
213th ECS Meeting | Series: | ECS Transactions Volume 13 No.01 | Editor: | Timans, P. J. et al. | ISBN: | 9781713819653 | Pages: | 474 (1 Vol) | Format: | Softcover | TOC: | View Table of Contents | Publ: | Electrochemical Society ( ECS ) | POD Publ: | Curran Associates, Inc. ( Nov 2020 ) |
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