 | Title: | Advanced Etch Technology for Nanopatterning VII | | Desc: | Proceedings of a meeting held 26-28 February 2018, San Jose, California, USA.
At SPIE Advanced Lithography | | Series: | Proceedings of SPIE Volume 10589 | | Editor: | Engelmann, Sebastian U. | | ISBN: | 9781510616707 | | Pages: | 164 (1 Vol) (approx) | | Format: | Softcover | | Publ: | SPIE - International Society For Optics and Photonics | | POD Publ: | Curran Associates, Inc. ( May 2018 ) |
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