ADVANCED ETCH TECHNOLOGY FOR NANOPATTERNING VIII

ADVANCED ETCH TECHNOLOGY FOR NANOPATTERNING VIII

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049338
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Details

  • Title: Advanced Etch Technology for Nanopatterning VIII
  • Subtitle: At SPIE Advanced Lithography
  • Date/Location: Held 25-26 February 2019, San Jose, California, USA.
  • Series: Proceedings of SPIE Volume 10963
  • Editor: Wise, Rich S.
  • ISBN: 9781510625730
  • Pages: 148 (1 Vol)
  • Format: Softcover
  • TOC Link: View Table of Contents
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( Jul 2019 )

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  • Title: Advanced Etch Technology for Nanopatterning VIII
  • Subtitle: At SPIE Advanced Lithography
  • Date/Location: Held 25-26 February 2019, San Jose, California, USA.
  • Series: Proceedings of SPIE Volume 10963
  • Editor: Wise, Rich S.
  • ISBN: 9781510625730
  • Pages: 148 (1 Vol)
  • Format: Softcover
  • TOC Link: View Table of Contents
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( Jul 2019 )