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ADVANCED ETCH TECHNOLOGY FOR NANOPATTERNING VIII
- Item #:
- 049338
- UPC:
Details
-
Title:
Advanced Etch Technology for Nanopatterning VIII
-
Subtitle:
At SPIE Advanced Lithography
-
Date/Location:
Held 25-26 February 2019, San Jose, California, USA.
-
Series:
Proceedings of SPIE Volume 10963
-
Editor:
Wise, Rich S.
-
ISBN:
9781510625730
-
Pages:
148 (1 Vol)
-
Format:
Softcover
-
TOC Link:
View Table of Contents
-
Publisher:
SPIE - International Society for Optics and Photonics
-
POD Publisher:
Curran Associates, Inc. ( Jul 2019 )
-
Title:
Advanced Etch Technology for Nanopatterning VIII
-
Subtitle:
At SPIE Advanced Lithography
-
Date/Location:
Held 25-26 February 2019, San Jose, California, USA.
-
Series:
Proceedings of SPIE Volume 10963
-
Editor:
Wise, Rich S.
-
ISBN:
9781510625730
-
Pages:
148 (1 Vol)
-
Format:
Softcover
-
TOC Link:
View Table of Contents
-
Publisher:
SPIE - International Society for Optics and Photonics
-
POD Publisher:
Curran Associates, Inc. ( Jul 2019 )