 | Title: | Advanced Etch Technology for Nanopatterning IX | | Desc: | Proceedings of a meeting held 25-26 February 2020, San Jose, California, USA.
At SPIE Advanced Lithography | | Series: | Proceedings of SPIE Volume 11329 | | Editor: | Wise, Rich S. | | ISBN: | 9781510634251 | | Pages: | 126 (1 Vol) | | Format: | Softcover | | TOC: | View Table of Contents | | Publ: | SPIE - International Society for Optics and Photonics | | POD Publ: | Curran Associates, Inc. ( Jun 2020 ) |
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