ADVANCED ETCH TECHNOLOGY FOR NANOPATTERNING IX

ADVANCED ETCH TECHNOLOGY FOR NANOPATTERNING IX

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054624
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Details

  • Title: Advanced Etch Technology for Nanopatterning IX
  • Subtitle: At SPIE Advanced Lithography
  • Date/Location: Held 25-26 February 2020, San Jose, California, USA.
  • Series: Proceedings of SPIE Volume 11329
  • Editor: Wise, Rich S.
  • ISBN: 9781510634251
  • Pages: 126 (1 Vol)
  • Format: Softcover
  • TOC Link: View Table of Contents
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( Jun 2020 )

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  • Title: Advanced Etch Technology for Nanopatterning IX
  • Subtitle: At SPIE Advanced Lithography
  • Date/Location: Held 25-26 February 2020, San Jose, California, USA.
  • Series: Proceedings of SPIE Volume 11329
  • Editor: Wise, Rich S.
  • ISBN: 9781510634251
  • Pages: 126 (1 Vol)
  • Format: Softcover
  • TOC Link: View Table of Contents
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( Jun 2020 )