EXTREME ULTRAVIOLET LITHOGRAPHY. INTERNATIONAL SYMPOSIUM. 2010. (3 VOLS)

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010231
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Details

  • Title: International Symposium on Extreme Ultraviolet Lithography 2010
  • Date/Location: Held 17-20 October 2010, Kobe, Japan.
  • ISBN: 9781617821776
  • Pages: 2,245 (3 Vols)
  • Format: Softcover
  • TOC Link: View Table of Contents
  • Publisher: Sematech
  • POD Publisher: Curran Associates, Inc. ( Jan 2011 )

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  • Title: International Symposium on Extreme Ultraviolet Lithography 2010
  • Date/Location: Held 17-20 October 2010, Kobe, Japan.
  • ISBN: 9781617821776
  • Pages: 2,245 (3 Vols)
  • Format: Softcover
  • TOC Link: View Table of Contents
  • Publisher: Sematech
  • POD Publisher: Curran Associates, Inc. ( Jan 2011 )