PHOTOMASK TECHNOLOGY 2024

Item #:
078110
Our Price: $154.00
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Details

  • Title: Photomask Technology 2024
  • Subtitle: At SPIE Photomask Technology + EUV Lithography
  • Date/Location: Held 30 September - 3 October 2024, Monterey, California, USA.
  • Series: Proceedings of SPIE Volume 13216
  • Editor: Kim, Seong-Sue
  • ISBN: 9781510681576
  • Pages: 626 (1 Vol)
  • Format: Softcover
  • TOC Link: View Table of Contents
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( Jan 2025 )

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  • Title: Photomask Technology 2024
  • Subtitle: At SPIE Photomask Technology + EUV Lithography
  • Date/Location: Held 30 September - 3 October 2024, Monterey, California, USA.
  • Series: Proceedings of SPIE Volume 13216
  • Editor: Kim, Seong-Sue
  • ISBN: 9781510681576
  • Pages: 626 (1 Vol)
  • Format: Softcover
  • TOC Link: View Table of Contents
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( Jan 2025 )