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PHOTOMASK TECHNOLOGY 2018
- Item #:
- 047836
- UPC:
Details
-
Title:
Photomask Technology 2018
-
Subtitle:
At SPIE Photomask Technology + Extreme Ultraviolet Lithography
-
Date/Location:
Held 17-19 September 2018, Monterey, California, USA.
-
Series:
Proceedings of SPIE Volume 10810
-
Editor:
Gallagher, Emily E.
-
ISBN:
9781510622159
-
Pages:
314 (1 Vol)
-
Format:
Softcover
-
TOC Link:
View Table of Contents
-
Publisher:
SPIE - International Society for Optics and Photonics
-
POD Publisher:
Curran Associates, Inc. ( Nov 2018 )
-
Title:
Photomask Technology 2018
-
Subtitle:
At SPIE Photomask Technology + Extreme Ultraviolet Lithography
-
Date/Location:
Held 17-19 September 2018, Monterey, California, USA.
-
Series:
Proceedings of SPIE Volume 10810
-
Editor:
Gallagher, Emily E.
-
ISBN:
9781510622159
-
Pages:
314 (1 Vol)
-
Format:
Softcover
-
TOC Link:
View Table of Contents
-
Publisher:
SPIE - International Society for Optics and Photonics
-
POD Publisher:
Curran Associates, Inc. ( Nov 2018 )